The invention belongs to the technical field of polysilicon substrates, and specifically relates to a manufacturing method of a substrate used for a low-warping polycrystalline silicon solar cell. Theinvention provides a surface sand-blasting texturing mode of the polycrystalline silicon solar cell, and the warping degree of the polycrystalline silicon after texturing can be controlled by using the mode. The two-faced texturing degree of the silicon wafer is adjusted through wet process sand-blasting so as to obtain the silicon wafer with texturing structures on two faces, then the damage degree of the band-blasting processing procedure on two faces of the silicon wafer is judged through the glossiness after texturing on the two faces of the silicon wafer, and then the warping degree of the silicon wafer is controlled so as to reduce the probability of fragment occurrence.