An etching apparatus for glass according to the embodiment of the invention includes a table, a nozzle part and at least one first heating unit, wherein the table provides a placing surface for arranging a glass substrate, the nozzle part is opposite to the table and ejects an etching solution in a direction towards the table, the glass substrate is placed between the nozzle part and the table, the at least one first heating unit heats a part of the table, the table includes a first part and a second part, the first part has a first average temperature, the second part is connected with the first part and has a second average temperature lower than the first average temperature, and the first heating unit is overlapped with the first part to heat the first part.