The invention discloses a low-temperature preparation method for thin film optical filters by adopting a vacuum coating machine. The low-temperature preparation method comprises the steps that a pairof electrodes is arranged at the positions between an evaporator source of a thin film material and an optical filter workpiece frame and abutting against the optical filter workpiece frame, and whenthe thin film material is evaporated in vacuum, the electrodes are applied on an alternating high voltage with the frequency of 50 Hz and voltage of 3.2-3.6 KV is applied to the electrodes; the thin film material is composed of zinc sulfide with a high refractive index and cryolite with a low refractive index, and is evaporated by an electron beam evaporation source and a resistance heating evaporation source correspondingly; and the electrodes are composed of two semicircular pure aluminum rings and are correspondingly arranged below the workpiece frame to form an approximate circular ring insulated from each other, and the size of the circular ring is changed with the size of the optical filter workpiece frame. The low-temperature preparation method for the thin film optical filters is suitable for preparing antireflection films, high reflective films, beam splitting films, polarizing films, depolarizing films, edge filters, band-pass filters and other thin film filters from variousbases which are sensitive to high temperature and must adopt low-temperature deposition.