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发明公开
CN109387937A 用于能变化地影响射线束的波前的设备 有权

用于能变化地影响射线束的波前的设备
摘要：
本发明涉及一种用于能变化地影响射线束的波前的设备，其具有平面镜(1)以及调整和保持装置(10)，该平面镜具有对称轴线(A)，调整和保持装置具有台座(2)，台座与平面镜(1)的周面(1.3)固定地连接，并且台座居中地贴靠在平面镜(1)的背侧(1.2)上。存在有套管(3)，其能够沿着对称轴线(A)在台座(2)中被线性调节，并且经由膜片弹簧(8)一方面与台座(2)固定地连接，并且另一方面与类似冠状的调节元件(5)固定地连接。类似冠状的调节元件(5)具有冠齿，冠齿作用到与平面镜(1)连接的保持压板(6)上并使保持压板变形，从而将与变形相对应的力输入到平面镜(1)中以使该平面镜变形。
摘要（英）：

The invention relates to a device for variably influencing the wavefront of a beam and provided with a planar mirror (1), comprising a first axis of symmetry (A), and an actuating and holding means (10) with a pedestal (2), the pedestal (2) being firmly connected to the peripheral surface (1.3) of the planar mirror (1) and centrally contacting the rear surface (1.2) of the planar mirror (1). Thereis a sleeve (3), which is linearly adjustable along the axis of symmetry (A) in the pedestal (2) and is firmly connected, via a membrane spring (8), to the pedestal (2), on the one hand, and to a crown-like adjusting element (5), on the other hand. The crown-like adjusting element (5) has crown spikes which act on retaining pressing plates (6) connected to the planar mirror (1) and deform them, thereby applying forces corresponding to the deformation into the planar mirror (1) in order to deform the latter.

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