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CN109423600B 掩膜条及其制备方法、掩膜板 有权

掩膜条及其制备方法、掩膜板
Abstract:
本发明公开了一种掩膜条及其制备方法、掩膜板，包括：掩膜条主体包括：沿预设拉伸方向排布的若干个掩膜单元，掩膜单元包括：掩膜区域和非掩膜区域，非掩膜区域上与掩膜条主体的边缘的距离小于等于第一预设距离的点所构成的区域为边侧区域，边侧区域内与对应的掩膜区域之间的距离小于等于第二预设距离的点所构成的区域为原始应力集中区域，边侧区域内除原始应力集中区域之外的其他区域内至少部分位置设置有应力集中结构。本发明的技术方案通过在边侧区域内除原始应力集中区域之外的其他区域内至少部分位置设置应力集中结构，可使得掩膜条在被拉伸时，边侧区域的应力分布更为均匀，从而能有效减小边侧区域的褶皱的幅度，提升蒸镀效果。
Abstract(English):

A mask strip, comprising: a plurality of mask units (2) in a first direction; each of the mask units (2) comprising a mask region (3) and a non-mask region (11) surrounding the mask region (3), the non-mask region (11) comprising a side region (4) and an original stress concentration region (6) inside the side region (4); each of the mask units (2) further comprising a stress concentration structure, wherein the stress concentration structure is within a part of the side region (4) other than the original stress concentration region (6). Also discloses a mask plate and a method of fabricating a mask strip.

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