The invention provides an exposure method, a measuring method, and an exposure device. The exposure method includes steps: obtaining vertical orthogonal polynomial movement tracks of a workpiece bench, a mask bench and a projection objective lens; obtaining horizontal orthogonal polynomial movement tracks of the workpiece bench, the mask bench and the projection objective lens; and transmitting track coefficients of the vertical orthogonal polynomial movement tracks and the horizontal orthogonal polynomial movement tracks to an executing mechanism. According to the exposure method, the measuring method, and the exposure device, the exposure method obtains distortion information of surface shape information of a mask plate and a substrate, position track coefficients of the workpiece bench,the mask bench and a space image are obtained through disassembling according to a coordinate system relation, the vertical orthogonal polynomial movement tracks and the horizontal orthogonal polynomial movement tracks are determined through compensation of the projection objective lens, the total surface shape compensation amount of the workpiece bench, and the total grid deformation compensation amount of the workpiece bench, the planed track is synchronously executed through the executing mechanism during exposure, and the exposure precision is ensured.