Provided are a vapor deposition carrier plate (100) and a method for using the vapor deposition carrier plate (100) to perform vapor deposition on a substrate (200). The vapor deposition carrier plate (100) comprises: a carrier plate body (110) which is provided with a loading surface (112) for loading the substrate (200); and a plurality of protrusions (120) detachably fixed onto the loading surface (112) of the carrier plate body (110). The substrate (200) comprises a side portion (210), a transition region (220) and a display region (230). The protrusions (120) comprise: first protrusions (121, 121'), at least one of the first protrusions (121) corresponding to the transition region (220); and a second protrusion (122) corresponding to the display region (230). To lower the risk in vapor deposition process, the carrier plate body (110) and the protrusions (120) are designed to be a separable combination, thus effectively reducing the probability of bonding and risk of fragment; moreover, the problem of nonuniform attachment of a metal mask caused by bend and deformation of the substrate (200) is solved, and the occurrence of lackluster products caused by displacement of a deposited film is lowered.