The invention relates to an ITO surface characteristic uniformization device. The ITO surface characteristic uniformization device comprises a vacuum box body, a feeding mechanism, a mobile mechanismand a plasma surface treating machine. The feeding mechanism and the mobile mechanism are installed in the vacuum box body from bottom to top in sequence. The plasma surface treating machine is arranged above the feeding mechanism. The plasma surface treating machine is installed on the mobile mechanism. A feeding inlet is formed in the left side of the vacuum box body. A discharging outlet is formed in the right side of the vacuum box body. The feeding mechanism comprises a closed barrel, a rotary roll, a rotary motor, a telescopic plate, a connecting rack, a sliding rack, a fixed frame and atelescopic frame. The mobile mechanism comprises a linear guide rail, a mobile rack, a transverse movement branch chain and a lengthways movement branch chain. With the ITO surface characteristic uniformization device, the problems that according to the ITO surface characteristic uniformization process in the prior art, surface treatment cannot be carried out on ITO continuously, the working efficiency is low, airtightness cannot be guaranteed when plasma is in use, and surface treatment is poor in uniformity are solved.