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发明公开
CN109991811A 一种酸扩散抑制剂及其制备方法与光刻胶组合物 无效 - 驳回 转让

一种酸扩散抑制剂及其制备方法与光刻胶组合物
摘要：
本发明公开了一种酸扩散抑制剂及其制备方法与光刻胶组合物，酸扩散抑制剂是以（甲基）丙烯酸酯为结构单元，在其中引入碱性基团形成的聚合物树脂。由具有碱性基团的（甲基）丙烯酸酯单体，在自由基引发剂存在的条件下，通过加热进行共聚反应制备而成，可用于制备光刻胶组合物。本发明提供了一种以聚合物形式存在的酸扩散抑制剂，它可以控制非曝光区的光酸扩散；同时能更有效改善本身在光刻胶内的分布，提高光刻胶分辨率和线宽粗糙度，改善光刻胶的成膜能力。
摘要（英）：

The invention discloses an acid diffusion inhibitor, a preparation method thereof and a photoresist composition. The acid diffusion inhibitor is polymer resin formed by using (methyl) acrylate as a structure unit and introducing basic groups into the (methyl) acrylate. The acid diffusion inhibitor is prepared by heating (methyl) acrylate monomers containing the basic groups for a copolymerizationreaction under the existence of a radical initiator and can be used for preparing the photoresist composition. The acid diffusion inhibitor exists in the form of a polymer and can control photo-acid diffusion in an unexposed region; and meanwhile, distribution of the acid diffusion inhibitor in a photoresist can be improved more effectively, the resolution and line width roughness of the photoresist are increased, and the film-forming capability of the photoresist is improved.

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