The invention discloses a method for constructing micro-nano patterns in high-molecule film lamellas through selective dissolution. According to the method, polyoxyethylene is utilized as a raw material and is completely dissolved into an organic solvent to obtain a mixed solution; the mixed solution is spin coated to a silicon wafer to obtain a polyoxyethylene film; melting isothermal crystallization is performed on the polyoxyethylene film under a nitrogen protective atmosphere; the organic solvent is utilized to dissolve the film subjected to the isothermal crystallization; the solvent is blown and dried after the dissolution is finished, and the different patterns can be constructed in the film lamellas. The method is simple and easy to operate; the method can be applied to constructing the different structural patterns in the high-molecule lamellas, can judge stability of the inside in the lamellas through structures and can provide technical research contents of important theoretical support and the like for researching the high-molecule crystallization materials. The effects on high-molecule crystallization can be theoretically deepened, a crystallization state can be regulated in actual application, performance is optimized, materials and products with preset performance can be obtained, and very important significances are achieved.