The invention discloses a fully-covered double-ridge corn planting method constructed based on soil tillage layer and adopting one film used for two years, and relates to the technical field of agricultural planting. The method comprises following steps: step one, organic fertilizer and chemical fertilizer are applied sufficiently to serve as base fertilizer after soil is thawed; step two, plow sole of soil is broken by deep ploughing, the fertilizer is buried by turning through rotary tillage, the ground is leveled, and ridging and film mulching are performed by a rotary tillage-ridging and film mulching machine; step three, water seepage holes are dug in planting ditches at intervals of 50 cm after film mulching to store rainwater; step five, when the temperature is stabilized at 10-12 DEG C for 5 days, corns are sown in sowing ditches by spot seeding, and plant spacing is 33-35 cm. By means of the method, the plow sole caused by rotary tillage of soil of traditional fully-covered double-ridge corn fields can be broken, soil moisture infiltration is increased, root growth is promoted, meanwhile, the mulching film is used for two years by one-time coverage, procedures of soil tillage, film uncovering, film covering and the like are reduced, means of production and labor input cost are saved, and mulching film reduction is realized.