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发明公开
CN110133969A 一种用于烘烤光刻胶的烘烤设备、烘烤系统及烘烤方法 有权

一种用于烘烤光刻胶的烘烤设备、烘烤系统及烘烤方法
摘要：
本申请公开了一种用于烘烤光刻胶的烘烤设备、烘烤系统及烘烤方法，所述烘烤设备包括：腔体，由相对设置的底板、顶板，以及位于所述底板和顶板之间的多个侧板围成，其中，一个所述侧板上设置有开口，所述顶板和非具有开口的所述侧板中的至少部分设置有至少一个第一发热元件；基台，设置于所述腔体内，所述基台内部设置有至少一个第二发热元件，所述基台的表面用于承载待烘烤元件；其中，所述待烘烤元件表面设置有光刻胶，所述第一发热元件和所述第二发热元件配合以烘烤所述光刻胶。通过上述方式，本申请能够在烘烤后使光刻胶的侧壁与待烘烤元件表面保持垂直。
摘要（英）：

The application discloses a baking device, baking system and baking method for baking a photoresist. The baking device comprises: a cavity defined by a bottom plate and a top plate which are oppositely disposed, and a plurality of side plates between the bottom plate and the top plate, wherein one of the side plates is provided with an opening, and at least parts of the top plate and the side plates having no opening are each provided with at least one first heat generating component; and a base disposed in the cavity and provided therein with at least one second heat generating component, wherein the surface of the base is used for holding a component to be baked, the surface of the component to be baked is provided with the photoresist, and the first heat generating component and the second heat generating component bake the photoresist in cooperation. The baking device is capable of keeping the side wall of the baked photoresist perpendicular to the surface of the component to be baked.

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