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发明公开
CN110517952A 基片处理装置 有权

基片处理装置
摘要：
本发明说明一种能够抑制臭氧的产生并且有效地处理基片的基片处理装置。基片处理装置包括：能够进行基片的处理的处理室；包含光源的光源室，其中该光源能够对基片的表面照射真空紫外光；能够对光源室内供给非活性气体的气体供给部；和控制部，其执行控制气体供给部以使得将光源室内维持为非活性气体气氛的处理。
摘要（英）：

The present invention provides a substrate processing apparatus capable of inhibiting generation of ozone and effectively processing a substrate. The substrate processing apparatus includes: a processing chamber configured to process a substrate; a light source chamber including a light source configured to irradiate vacuum ultraviolet light onto a surface of the substrate; a gas supply configuredto supply an inert gas into the light source chamber; and a controller that controls the gas supply to maintain the light source chamber in an inert gas atmosphere.

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