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发明公开
CN111074214A 沉积设备和使用该沉积设备的沉积方法 审中-公开

沉积设备和使用该沉积设备的沉积方法
摘要：
本申请涉及沉积设备和沉积方法。该沉积设备包括腔室、平台、沉积源、多个喷嘴和电离器，其中，平台设置在腔室内并且在平台上放置有目标衬底；沉积源设置在腔室内并包括沉积材料；多个喷嘴连接至位于腔室内的沉积源，以在平台的方向上喷射沉积材料；电离器设置在喷嘴与平台之间，以使从喷嘴喷射的沉积材料带电荷。在电离器和喷嘴中的每一个中生成第一电场，并且在平台与电离器之间生成第二电场，该第二电场具有比第一电场小的强度。喷嘴中的每一个包括多个突出尖端，多个突出尖端设置在喷嘴中的每一个的内表面上，以使沉积材料带电荷。
摘要（英）：

A deposition apparatus includes a chamber, a stage which is disposed within the chamber and on which a target substrate can be seated, a deposition source disposed within the chamber and including a deposition material, a plurality of nozzles connected to the deposition source within the chamber to inject the deposition material in a direction of the stage, and an ionizer disposed between the nozzles and the stage to charge the deposition material injected from the nozzles. A first electric field is generated in each of the ionizer and the nozzles, and a second electric field having an intensity less than the first electric field is generated between the stage and the ionizer. Each of the nozzles may include a plurality of protrusion tips disposed on an inner surface of each of the nozzles to charge the deposition material.

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