To provide a substrate treatment apparatus capable of accurately controlling the distance between a discharging port and a substrate and having a nozzle easy to manufacture. In the substrate treatment 1, linear gauges 81, 82 for measuring the vertical position as the position in the direction perpendicular to the substrate to be treated measure the vertical position of the discharging port 41c ofthe slit nozzle 41 to discharge the treatment liquid to the substrate to be treated and the measured sites P, P' and control vertical movement of the slit nozzle 41 by lift mechanisms 43, 44 to transfer the slit nozzle 41 in the direction vertical to the substrate utilizing the measured result of the vertical position.