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CN1879952B 一种研磨涂覆晶种层生长制备沸石膜方法 失效 - 权利终止 复审申请

一种研磨涂覆晶种层生长制备沸石膜方法
摘要：
本发明属于化学工程技术领域的无机膜制备方法，涉及到一种研磨涂覆晶种层生长制备沸石膜方法。其特征是按照一定的Na2O：SiO2：Al2O3：H2O的摩尔配比配制出凝胶, 合成出微米级的晶粒, 经研磨后用溶剂分散制备出纳米或亚微米级晶种悬浮液, 在多孔支撑体上，以提拉法涂上晶种层，经干燥和焙烧固化后, 放入不锈钢釜中，注入按一定的Na2O：SiO2：Al2O3：H2O的摩尔比配制的凝胶液将其浸没，密封后置于160-180℃的温度下，恒温40-60小时, 最后经取出, 洗涤, 干燥和焙烧后得到沸石膜。本发明降低了纳米或亚微米级晶种层制备的难度，沸石膜制备重复性好，适合工业规模制备和应用；对载体粗糙度限制低；具有实用性和通用性,对其它种类沸石膜的制备有重要借鉴意义。
摘要（英）：

The invention relates to a method for preparing inorganic film, especially providing a method for preparing zeolitic film via grinding and coating crystal seed layer, wherein the invention is characterized in that: preparing gel based on the mol ratio as Na2O:SiO2:Al2O3:H2O, to obtain the micrometer crystal; grinding and dispersing it in dissolvent to obtain the nanometer or sub micrometer crystal suspension; on the porous support, using drawing method to coat the crystal layer, to be dried and baked to be arranged into stainless steel kettle; filling the gel liquid to dip it; sealing and arranging it under the temperature at 160-180Deg. C, for 40-60 hours; then taking out, washing, drying and baking to obtain the final product. The invention can reduce the preparation hard, with the application of batch production.

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