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发明授权
CN1940722B 用于浸润式微影制程的涂布材料以及浸润式微影的方法 失效 - 权利终止

用于浸润式微影制程的涂布材料以及浸润式微影的方法
摘要：
本发明是有关一种涂布于光阻层上用于浸润式微影制程的涂布材料以及浸润式微影的方法。该涂布材料包含聚合物和酸，聚合物实质性不溶于浸润式流体，酸用以中和来自光阻层的碱性抑制剂(quencher)。一种浸润式微影的方法，包含：形成一光阻层在一基板上，该光阻层包含一碱性抑制剂；形成一涂布材料层在该光阻层上，其中该涂布材料层包含：一酸，以及一聚合物。本发明能有效的改善和避免水纹缺陷。
摘要（英）：

The present invention relates to a coating material coating on a photoresist layer during an immersion lithography process includes a polymer that is substantially insoluble to an immersion fluid and an acid capable of neutralizing a base quencher from the photoresist layer. The present invention also relates to an immersion lithography method comprises: forming a photoresist layer, which contains an alkaline quencher, on a substrate; forming a coating material layer, which contains an acid and a polymer, on the photoresist layer. The invention can effectively improve and present water mark defects.

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