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发明公开
CN1965067A 制备方法和体系、组分、表面活性剂、单体单元、金属配合物、磷酸酯、二元醇、水性成膜泡沫以及泡沫稳定剂 无效 - 撤回

制备方法和体系、组分、表面活性剂、单体单元、金属配合物、磷酸酯、二元醇、水性成膜泡沫以及泡沫稳定剂
摘要：
提供制备方法和体系，包括使卤代化合物反应、使化合物脱卤化，使醇类反应，使烯烃和饱和化合物反应，使含有至少两个－CF3基团的反应物与含有环状基团的反应物反应。RF－组分如RF－中间体，RF－表面活性剂，RF－单体，RF－单体单元，RF－金属配合物，RF－磷酸酯，RF－二元醇，RF－氨基甲酸酯和/或RF－泡沫稳定剂。所述RF部分可以包含至少两个－CF3基团，至少三个－CF3基团和/或至少两个－CF3基团和至少两个－CH2－基团。提供包含RF－表面活性剂组分的清洁剂、乳化剂、油漆、粘合剂、油墨、润湿剂、发泡剂和消泡剂。提供包含RF－单体单元的丙烯酸类、树脂和聚合物。提供包含其上有RF－组分的基质的组分。提供可以包含RF－表面活性剂和/或RF－泡沫稳定剂的水性成膜泡沫(“AFFF”)配方。
摘要（英）：

Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two -CF3 groups with reactants having cyclic groups. RF-compositions such as RF-intermediates, RF-surfactants, RFmonomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RFurethanes, and/or RF-foam stabilizers. The RF portion can include at least two -CF3 groups, at least three -CF3 groups, and/or at least two -CF3 groups and at least two -CH2- groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover. Aqueous Film Forming Foam (''AFFF'') formulations are provided that can include RFsurfactants and/or RF-foam stabilizers are provided.

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