发明公开
EP0009031A4 DESENSITIZING SOLUTION AND PROCESS FOR TREATING A DIAZO PHOTOSENSITIVE PRINTING PLATE.
失效
用于治疗重氮感光压盘耐光MACH解决方案和方法。
- 专利标题: DESENSITIZING SOLUTION AND PROCESS FOR TREATING A DIAZO PHOTOSENSITIVE PRINTING PLATE.
- 专利标题(中): 用于治疗重氮感光压盘耐光MACH解决方案和方法。
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申请号: EP79900214申请日: 1979-08-28
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公开(公告)号: EP0009031A4公开(公告)日: 1981-08-28
- 发明人: LANGLAIS EUGENE L
- 申请人: NAPP SYSTEMS INC
- 专利权人: NAPP SYSTEMS INC
- 当前专利权人: NAPP SYSTEMS INC
- 优先权: US87536778 1978-02-06
- 主分类号: B41N3/08
- IPC分类号: B41N3/08 ; C09K3/00 ; G03C20060101 ; G03C1/52 ; G03F7/00 ; G03F7/32 ; G03F7/40 ; G03C5/34 ; G03F7/02
摘要:
A desensitizing solution and process For using the solution are disclosed to desensitize a diazo photosensitive printing plate after development. The solution comprises a water soluble desensitizing agent having the formula (FORMULA) where Y is an acid group or a water soluble salt of said acid group and wherein R is another Y, hydrogen, an aliphatic hydrocarbon or an aromatic hydrocarbon which reacts with any residual photosensitive diazo on the developed plate to render the diazo incapable of forming an oleophilic substance and a filming agent selected from water soluble aliphatic polyols have less than eight carbon units, the acid derived monoesters of these polyols, and the alkali metal salts of the monoesters.
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