发明公开
- 专利标题： Photosensitive condensation product, photosensitive compositions and lithographic printing plates containing said condensation product
- 专利标题（中）： 光敏缩合产物，光敏组合物和含有该缩合产物的平版印刷版。
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申请号： EP80301957.9申请日： 1980-06-10
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公开(公告)号： EP0021718A1公开(公告)日： 1981-01-07
- 发明人: Uehara, Masafumi , Shimada, Fumio , Iwaki, Akio , Matsuzaki, Masatoshi , Ogawa, Yoko
- 申请人： KONICA CORPORATION
- 申请人地址： 26-2, Nishi-shinjuku 1-chome Shinjuku-ku Tokyo 163 JP
- 专利权人： KONICA CORPORATION
- 当前专利权人： KONICA CORPORATION
- 当前专利权人地址： 26-2, Nishi-shinjuku 1-chome Shinjuku-ku Tokyo 163 JP
- 代理机构： Ellis-Jones, Patrick George Armine
- 优先权： JP76216/79 19790616
- 主分类号： G03C1/52
- IPC分类号： G03C1/52 ; G03F7/08 ; B41N1/14
摘要：
A photosensitive composite is provided for use in photosensitive lithographic printing plates which is a condensation product of sulfonylchloride of an o-benzoquinonediazid or o-naphthoquinonediazid and a polyhydric phenol resin possessing 3 or more units having the following general formula:
where R, is a hydrogen atom or a hydroxyl group, R 2 is a hydrogen or halogen atom or an alkyl or alkoxy group having 1 to 4 carbon atoms, R 3 is a hydrogen atom, an alkyl group having 1 to4 carbon atoms, an aryl group of a substituted aryl group and R 4 is a hydrogen or halogen atom or an alkyl, alkoxy or nitro group.
where R, is a hydrogen atom or a hydroxyl group, R 2 is a hydrogen or halogen atom or an alkyl or alkoxy group having 1 to 4 carbon atoms, R 3 is a hydrogen atom, an alkyl group having 1 to4 carbon atoms, an aryl group of a substituted aryl group and R 4 is a hydrogen or halogen atom or an alkyl, alkoxy or nitro group.
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