发明授权
- 专利标题: ELECTRON BEAM SYSTEM
- 专利标题(中): 电子束系统
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申请号: EP80901880.7申请日: 1980-09-11
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公开(公告)号: EP0035556B1公开(公告)日: 1984-04-25
- 发明人: REEDS, JR., John W.
- 申请人: Hughes Aircraft Company
- 申请人地址: 7200 Hughes Terrace Los Angeles, CA 90045-0028 US
- 专利权人: Hughes Aircraft Company
- 当前专利权人: Hughes Aircraft Company
- 当前专利权人地址: 7200 Hughes Terrace Los Angeles, CA 90045-0028 US
- 代理机构: Milhench, Howard Leslie (GB)
- 优先权: US75354 19790913
- 国际公布: WO8100784 19810319
- 主分类号: H01J37/30
- IPC分类号: H01J37/30 ; H01J37/09 ; G21K1/08
摘要:
Electron beam lens (22) can be operated in a first mode to demagnify and focus the image of electron source (14) at image plane (32). Electron optical lenses (34) and (46) further demagnify the image plane (32) through the focal point (60) on the face of target (58) to provide a scannable exposure spot. Electron optical lens (22) can be operated in the second mode which floods aperture (32) so that the image of the aperture is demagnified and focused on target (58) to provide a large exposure area.
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