发明公开
- 专利标题: Method for making CRT shadow masks
- 专利标题(中): 一种用于制造荫罩的阴极射线管的过程。
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申请号: EP82304505.9申请日: 1982-08-26
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公开(公告)号: EP0074738A2公开(公告)日: 1983-03-23
- 发明人: Ohtaka, Yasuhisa c/o Patent Division , Kamohara, Eiji c/o Patent Division , Seino, Kazuyuki c/o Patent Division
- 申请人: KABUSHIKI KAISHA TOSHIBA
- 申请人地址: 72, Horikawa-cho, Saiwai-ku Kawasaki-shi, Kanagawa-ken 210 JP
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: 72, Horikawa-cho, Saiwai-ku Kawasaki-shi, Kanagawa-ken 210 JP
- 代理机构: Kirk, Geoffrey Thomas
- 优先权: JP141740/81 19810910
- 主分类号: H01J29/07
- IPC分类号: H01J29/07
摘要:
A method of making mask structure including two or more masks for a mask-focusing colour picture tube and the mask structure formed by the method. A plurality of apertured flat masks, each mask comprising an effective portion having apertures and a border surrounding the effective portion are stacked with the apertures aligned, then filling material is poured into the apertures. The filling material is solidified thereby fixing the flat masks together. The fixed masks are pressed into a predetermined curved shape. Then, the filling material is removed from the apertures and the masks are separated.
公开/授权文献
- EP0074738B1 Method for making CRT shadow masks 公开/授权日:1986-06-11
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