发明公开
- 专利标题： Resist material and process for forming fine resist pattern
- 专利标题（中）： 抗蚀剂材料和方法用于制造精细的抗蚀剂图案。
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申请号： EP82111725.6申请日： 1982-12-17
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公开(公告)号： EP0090089A2公开(公告)日： 1983-10-05
- 发明人: Fujii, Tsuneo , Inukai, Hiroshi , Deguchi, Takayuki , Amano, Toshihiko , Kakuchi, Masami , Asakawa, Hiroshi , Kogure, Osamu
- 申请人： Daikin Kogyo Co., Ltd. , NIPPON TELEGRAPH AND TELEPHONE CORPORATION
- 申请人地址： Shinhankyu Building No 1-12-39, Umeda Kita-ku Osaka-shi Osaka-fu JP
- 专利权人： Daikin Kogyo Co., Ltd.,NIPPON TELEGRAPH AND TELEPHONE CORPORATION
- 当前专利权人： Daikin Kogyo Co., Ltd.,NIPPON TELEGRAPH AND TELEPHONE CORPORATION
- 当前专利权人地址： Shinhankyu Building No 1-12-39, Umeda Kita-ku Osaka-shi Osaka-fu JP
- 代理机构： Türk, Dietmar, Dr. rer. nat.
- 优先权： JP205876/81 19811219; JP205877/81 19811219; JP212729/81 19811226; JP212730/81 19811226
- 主分类号： G03F7/10
- IPC分类号： G03F7/10
摘要：
A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula:
wherein R, is methyl group, ethyl group, a halogensub- stituted methyl or ethyl group, a halogen atom or hydrogen atom, R 2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R f is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an a-cyanoacrylate.
wherein R, is methyl group, ethyl group, a halogensub- stituted methyl or ethyl group, a halogen atom or hydrogen atom, R 2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R f is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an a-cyanoacrylate.
公开/授权文献
- EP0090089B1 Resist material and process for forming fine resist pattern 公开/授权日：1988-10-05
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