发明公开
- 专利标题: Method of making oxide films
- 专利标题(中): 制备氧化膜的方法
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申请号: EP83305394申请日: 1983-09-15
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公开(公告)号: EP0107325A3公开(公告)日: 1985-01-09
- 发明人: Stall, Richard Alan
- 申请人: Western Electric Company, Incorporated
- 专利权人: Western Electric Company, Incorporated
- 当前专利权人: Western Electric Company, Incorporated
- 优先权: US422673 19820924
- 主分类号: C23C13/04
- IPC分类号: C23C13/04
摘要:
Oxide (R m 0 n ) films are grown by evaporation from separate sources of element (R) and an oxide (M r O s ) which serves as the oxygen source. The oxide (M r O s ) should sublimate congruently; i.e., without decomposing into oxygen and its constituent element (M). On the growth surface this oxide (M r O s ) can react with the element (R) to form another oxide (R m O n ) that is thermodynamically more stable:
Using this technique, films of Al z O 3 , MgO, Si0 2 and MgAl 2 O 4 have been grown using As 2 0 3 or Sb 2 0 3 as the oxygen source.
Using this technique, films of Al z O 3 , MgO, Si0 2 and MgAl 2 O 4 have been grown using As 2 0 3 or Sb 2 0 3 as the oxygen source.
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