发明公开
- 专利标题: Silver halide photographic light-sensitive materials
- 专利标题(中): 卤化银照相感光材料
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申请号: EP85110265申请日: 1985-08-16
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公开(公告)号: EP0175148A3公开(公告)日: 1988-10-05
- 发明人: Ikeda, Hideo , Ohno, Shigeru , Nakamura, Koki , Miyasaka, Nobuaki
- 申请人: FUJI PHOTO FILM CO., LTD.
- 专利权人: FUJI PHOTO FILM CO., LTD.
- 当前专利权人: FUJI PHOTO FILM CO., LTD.
- 优先权: JP17058884 19840816
- 主分类号: G03C01/34
- IPC分类号: G03C01/34 ; C07D235/28 ; C07D277/72
摘要:
A silver halide photographic light-sensitive material comprising a support having coated thereon at least one silver halide emulsion layer and a surface protecting layer, said silver halide photographic light-sensitive material comprising photosensitive silver halide grains and internally fogged silver halide grains, said intemally fogged silver halide grains having adsorbed thereon at least one compound represented by the formula (I):
wherein X represents -0-, -NH- or -S-, R 1 , R 2 , R 3 and R 4 represent hydrogen atom or a substituent, and at least one of R,, R 2 , R, and R. is substituted or unsubstituted alkyl or aryl group having up to 13 carbon atoms, which is bonded directly or through a divalent linkage group, to the aromatic nucleus.
wherein X represents -0-, -NH- or -S-, R 1 , R 2 , R 3 and R 4 represent hydrogen atom or a substituent, and at least one of R,, R 2 , R, and R. is substituted or unsubstituted alkyl or aryl group having up to 13 carbon atoms, which is bonded directly or through a divalent linkage group, to the aromatic nucleus.
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