There is disclosed a compound having the structure
wherein A and A' are radicals independently selected from the group consisting of the following structures:
and
wherein R 1 and R 2 are tertiary alkyl radicals having 4 to 8, preferably 4 to 6 carbon atoms, n is a whole number of 1 to 8, R 3 and R 4 are the same or different radicals selected from the group consisting of hydrogen and alkyl radicals having 1 to 18 carbon atoms, R 5 is hydrogen or methyl and Z is -0- or
A' can also be hydrogen; and X is a divalent oligomeric segmer having the structure:
wherein m ranges from an average of 4 to about 24. There is also disclosed a polymeric composition comprising a polymer susceptible to the degradative effects of oxidation having incorporated therein an antidegradant amount of a compound Structure I.