发明公开
- 专利标题: Dual-wavelength laser apparatus
- 专利标题(中): 双波长激光装置
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申请号: EP86302174申请日: 1986-03-25
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公开(公告)号: EP0196856A3公开(公告)日: 1988-06-15
- 发明人: Uehara, Kiyoji , Ueki, Takashi , Tanaka, Hiroaki , Tai, Hideo
- 申请人: TOKYO GAS CO., LTD.
- 专利权人: TOKYO GAS CO., LTD.
- 当前专利权人: TOKYO GAS CO., LTD.
- 优先权: JP6187685 19850328
- 主分类号: H01S03/105
- IPC分类号: H01S03/105 ; H01S03/106 ; H01S03/139
摘要:
@ There is disclosed a dual-wavelength laser apparatus including a laser emitting a laser beam consisting of two wavelength components, a methane cell for controlling and equalizing gains of the two wavelength components, a cavity length modulator including a piezoelectric element for periodically modulating the cavity length of the laser, and a feedback circuit for controlling the modulation center such that the sum of outputs of the two modulated wavelength components is kept substantially constant. The feedback circuit includes a detector for detecting a laser output, a lock-in amplifier for detecting and amplifying an output from the detector, an integrator for integrating an output from the lock-in amplifier, and a high-voltage amplifier for generating a bias voltage set by the integrator.
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