发明公开
EP0202705A1 Patterned polyimide film, a photosensitive polyamide acid derivative and an electrophoretic image-display cell
失效
图案化的聚酰亚胺膜，光敏聚酰胺酸衍生物和电泳图像显示单元
- 专利标题： Patterned polyimide film, a photosensitive polyamide acid derivative and an electrophoretic image-display cell
- 专利标题（中）： 图案化的聚酰亚胺膜，光敏聚酰胺酸衍生物和电泳图像显示单元
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申请号： EP86200758.0申请日： 1986-05-02
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公开(公告)号： EP0202705A1公开(公告)日： 1986-11-26
- 发明人: van der Zande, Johan Maria , Minnema, Lourens
- 申请人： Philips Electronics N.V.
- 申请人地址： Groenewoudseweg 1 5621 BA Eindhoven NL
- 专利权人： Philips Electronics N.V.
- 当前专利权人： Philips Electronics N.V.
- 当前专利权人地址： Groenewoudseweg 1 5621 BA Eindhoven NL
- 代理机构： Weening, Cornelis (NL)
- 优先权： NL8501304 19850508
- 主分类号： G03F7/095
- IPC分类号： G03F7/095 ; G02F1/19 ; C08G73/10 ; G03F7/038
摘要：
A method of manufacturing a polyimide pattern which is provided with a metal layer, such that a dual layer system is exposed in accordance with a certain pattern, which pattern contains a photosensitive polyamide acid derivative and a positive photoresist which is developed, provided with a metal layer and removed, after which, the polyamide acid derivative layer is developed and imidisied, as well as a new photosensitive polyamide acid derivative and an electrophoretic image-display cell.
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