发明公开
- 专利标题： Process for producing novel photosensitive resins
- 专利标题（中）： 生产新型感光树脂的方法
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申请号： EP86108944.9申请日： 1986-07-01
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公开(公告)号： EP0207495A3公开(公告)日： 1990-01-24
- 发明人: Serizawa, Hajime , Ogihara, Keizo , Shimizu, Kiyoshi , Harada, Susumu
- 申请人： NITTO BOSEKI CO., LTD.
- 申请人地址： 1 Aza Higashi Gonome Fukushima-shi Fukushima-ken JP
- 专利权人： NITTO BOSEKI CO., LTD.
- 当前专利权人： NITTO BOSEKI CO., LTD.
- 当前专利权人地址： 1 Aza Higashi Gonome Fukushima-shi Fukushima-ken JP
- 代理机构： Eitle, Werner, Dipl.-Ing.
- 优先权： JP148036/85 19850705
- 主分类号： C08F8/00
- IPC分类号： C08F8/00
摘要：
A process for producing a novel photosensitive resin having cinnamic groups, comprising reacting a polyallylamine represented by the general formula (I)
wherein n is at least 10) or an inorganic acid salt thereof with a ompound having a cinnamic group in the presence of a plvent. The process is free from drawbacks as experienced in as production of a conventional photosensitive resin (e.g. olyvinyl cinnamate), such as formation of by-products dur- µg the polymerization of a monomer (e.g. vinyl cinnamate).
wherein n is at least 10) or an inorganic acid salt thereof with a ompound having a cinnamic group in the presence of a plvent. The process is free from drawbacks as experienced in as production of a conventional photosensitive resin (e.g. olyvinyl cinnamate), such as formation of by-products dur- µg the polymerization of a monomer (e.g. vinyl cinnamate).
公开/授权文献
- EP0207495A2 Process for producing novel photosensitive resins 公开/授权日：1987-01-07
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