发明公开
- 专利标题: Method of making a photosensor
- 专利标题(中): 制作光电传感器的方法
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申请号: EP89101545.5申请日: 1989-01-30
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公开(公告)号: EP0326178A3公开(公告)日: 1990-06-27
- 发明人: Ogawa, Hirofumi , Sameshima, Kenji , Hirai, Tadaaki , Unnai, Takaaki , Yamamoto, Masanao , Shidara, Keiichi , Yamazaki, Junichi Gurin Puraza Hazumi 205 , Hiruma, Eikiyu , Suzuki, Shirou
- 申请人: HITACHI, LTD. , NIPPON HOSO KYOKAI
- 申请人地址: 6, Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 101 JP
- 专利权人: HITACHI, LTD.,NIPPON HOSO KYOKAI
- 当前专利权人: HITACHI, LTD.,NIPPON HOSO KYOKAI
- 当前专利权人地址: 6, Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 101 JP
- 代理机构: Beetz & Partner Patentanwälte
- 优先权: JP15940/88 19880128
- 主分类号: H01L31/20
- IPC分类号: H01L31/20 ; H01L31/107 ; H01L31/0272
摘要:
A method of making an image pickup tube target (Fig. 1A), etc., using an amorphous photoconductive layer (4). When an electrode (2 or 7), an amorphous semiconductor layer (4), etc., are provided on a substrate (1 or 6), the steps of ion etching away a surface of the substrate (1 or 6) and forming the electrode (2 or 7) are performed so that a target (Fig. 1A) is produced in which no defects are substantially caused in a reproduced image even if a high electric field is applied across the target.
公开/授权文献
- EP0326178B1 Method of making a photosensor 公开/授权日:1994-12-21
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