发明公开
- 专利标题: Self-tuning controller apparatus and process control system
- 专利标题(中): 自调节控制器设备和过程控制系统
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申请号: EP89117274.4申请日: 1989-09-19
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公开(公告)号: EP0360206A3公开(公告)日: 1990-12-19
- 发明人: Saito, Tadayoshi , Takahashi, Susumu , Tachibana, Kouji , Kawakami, Junzo , Yokokawa, Nobuyuki
- 申请人: HITACHI, LTD.
- 申请人地址: 6, Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 100 JP
- 专利权人: HITACHI, LTD.
- 当前专利权人: HITACHI, LTD.
- 当前专利权人地址: 6, Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 100 JP
- 代理机构: Altenburg, Udo, Dipl.-Phys.
- 优先权: JP234994/88 19880921; JP4928/89 19890113
- 主分类号: G05B13/02
- IPC分类号: G05B13/02
摘要:
A self-tuning controller apparatus which comprises: a control response pattern recognition portion (4) for receiving a set-point (SV) and a controlled variable (PV) of a process and for obtaining three performance indexes from a controlled variable response pattern generated in response to a change in the set-point or a disturbance; a control parameter correction portion (6) for qualitatively evaluating the three performance indexes and for inferring a correction value of a PID control parameter on the basis of the result of evaluation; and a control performance dissatisfaction degree evaluation portion (7) for evaluating the inferred correction value of the PID control parameter in accordance with the dissatisfaction degrees of the two performance indexes for the respective target specifications of the two of the three performance indexes. The control performance dissatisfaction degree evaluation portion acts to make the PID control parameter converge stably. In a process control system including a plurality of vertically distributed control elements each capable of self-tuning its control parameter, the control performance dissatisfaction degree evaluation portion contributes to autonomous functioning of each of the control elements.
公开/授权文献
- EP0360206A2 Self-tuning controller apparatus and process control system 公开/授权日:1990-03-28
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