发明公开
- 专利标题： Electrophotosensitive material
- 专利标题（中）： 电光敏材料
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申请号： EP90106166.3申请日： 1990-03-30
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公开(公告)号： EP0390195A1公开(公告)日： 1990-10-03
- 发明人: Muto, Nariaki , Kakui, Mikio , Sumida, Keisuke , Nakazawa, Toru , Matsumoto, Kazuo
- 申请人： MITA INDUSTRIAL CO., LTD.
- 申请人地址： 2-28, 1-chome, Tamatsukuri Chuo-ku Osaka 540 JP
- 专利权人： MITA INDUSTRIAL CO., LTD.
- 当前专利权人： MITA INDUSTRIAL CO., LTD.
- 当前专利权人地址： 2-28, 1-chome, Tamatsukuri Chuo-ku Osaka 540 JP
- 代理机构： Bohnenberger, Johannes, Dr.
- 优先权： JP80019/89 19890330
- 主分类号： G03G5/06
- IPC分类号： G03G5/06
摘要：
The present invention provides an electrophotosensitive material comprising a conductive substrate. and a photosensitive layer provided on the conductive substrate and containing a m-phenylenediamine compound represented by the general formula [I]:
wherein R¹, R², R³, R⁴ and R are the same as one another, or are different from one another, and represent a hydrogen atom, an alkyl group, an alkoxy group or a halogen atom, provided that, when one of R¹ and R⁴ is the hydrogen atom, the other should not be the hydrogen atom, ahd when one of R² and R³ is the hydrogen atom, the other should not be the hydrogen atom.
wherein R¹, R², R³, R⁴ and R are the same as one another, or are different from one another, and represent a hydrogen atom, an alkyl group, an alkoxy group or a halogen atom, provided that, when one of R¹ and R⁴ is the hydrogen atom, the other should not be the hydrogen atom, ahd when one of R² and R³ is the hydrogen atom, the other should not be the hydrogen atom.
公开/授权文献
- EP0390195B1 Electrophotosensitive material 公开/授权日：1994-03-02
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