发明公开
- 专利标题: Method for manufacturing multiturn thin film coil
- 专利标题(中): 制造多层薄膜线圈的方法
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申请号: EP90111142.7申请日: 1990-06-13
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公开(公告)号: EP0402880A3公开(公告)日: 1991-08-14
- 发明人: Nagata, Yuji , Fukazawa, Toshio , Wada, Kumiko , Tosaki, Yoshihiro
- 申请人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 申请人地址: 1006, Oaza Kadoma Kadoma-shi, Osaka-fu, 571 JP
- 专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人地址: 1006, Oaza Kadoma Kadoma-shi, Osaka-fu, 571 JP
- 代理机构: Eisenführ, Speiser & Partner
- 优先权: JP155350/89 19890616; JP172236/89 19890703
- 主分类号: H01F5/00
- IPC分类号: H01F5/00 ; G11B5/17 ; G11B5/31
摘要:
A method for manufacturing a multiturn coil or a film magnetic head including a multiturn coil. This multiturn coil manufacturing method includes the following steps. First a laminate (15, 45) made up of conducting layers (14a-14d, 47a-47d) for coil and insulating layers (13a-13d, 46a-46d) for coil is formed on a substrate (10) and a base layer (11) formed on it at a given inclination (ϑ). Then, this laminate (15, 45) is made U-shaped by photolithography. In the next step the topside of the laminate (15, 45) in both discontinued end sections is flattened for the end faces of all conducting layers are revealed at once. Finally, filmy conductive strips (19a-19c, 61a-61c) are formed in these revealed portions to complete a multiturn coil.
公开/授权文献
- EP0402880B1 Method for manufacturing multiturn thin film coil 公开/授权日:1994-08-24
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