发明公开
- 专利标题: Manufacturing method of optical diffraction grating element
- 专利标题(中): 光学衍射元件的制造方法
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申请号: EP90312388.3申请日: 1990-11-13
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公开(公告)号: EP0428390A3公开(公告)日: 1992-05-27
- 发明人: Sakai, Keiji , Kubo, Katsuhiro , Kurata, Yukio
- 申请人: SHARP KABUSHIKI KAISHA
- 申请人地址: 22-22 Nagaike-cho Abeno-ku Osaka 545 JP
- 专利权人: SHARP KABUSHIKI KAISHA
- 当前专利权人: SHARP KABUSHIKI KAISHA
- 当前专利权人地址: 22-22 Nagaike-cho Abeno-ku Osaka 545 JP
- 代理机构: Brown, Kenneth Richard
- 优先权: JP294403/89 19891113; JP298100/89 19891115
- 主分类号: G02B5/18
- IPC分类号: G02B5/18
摘要:
The method of manufacturing an optical diffraction grating element of the present invention is characterized in adopting an ion beam made from a gas chemically reacting with a glass substrate when forming a diffraction grating having a serrated profile upon the glass substrate through an ion beam etching method. Also, when manufacturing an optical diffraction grating element that is divided into a plurality of regions whereon diffraction gratings having different diffraction angles with respect to an incident light are provided, the method of the present invention is characterized in forming slits into a resist film disposed upon a transparent substrate such as a glass substrate, in accordance with the patterns of the diffraction gratings, such that the width of the slits is constant irrespectively of the regions. Accordingly, the method of manufacturing - an optical diffraction grating element of the present invention enables to improve the diffraction efficiency of the optical diffraction grating element, and to enhance the optical efficiency of an optical head device. The SN ratio of the output signals released by the optical head device may be thus improved and the servo error control executed accurately.
公开/授权文献
- EP0428390B1 Manufacturing method of optical diffraction grating element 公开/授权日:1996-03-06
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