发明公开
EP0455247A2 m-Phenylenediamine compound and electrophotosensitive material using said compound
失效
Meta-Phenylendiaminverbindung und elektrophotometpfindliches材料，das diese Verbindung verwendet。
- 专利标题： m-Phenylenediamine compound and electrophotosensitive material using said compound
- 专利标题（中）： Meta-Phenylendiaminverbindung und elektrophotometpfindliches材料，das diese Verbindung verwendet。
-
申请号： EP91107132.2申请日： 1991-05-02
-
公开(公告)号： EP0455247A2公开(公告)日： 1991-11-06
- 发明人: Miyamoto, Eiichi , Muto, Nariaki , Maeda, Tatsuo , Sumida, Keisuke , Kimura, Tadao
- 申请人： MITA INDUSTRIAL CO. LTD.
- 申请人地址： 2-28, 1-chome, Tamatsukuri Chuo-ku Osaka-shi Osaka 540 JP
- 专利权人： MITA INDUSTRIAL CO. LTD.
- 当前专利权人： MITA INDUSTRIAL CO. LTD.
- 当前专利权人地址： 2-28, 1-chome, Tamatsukuri Chuo-ku Osaka-shi Osaka 540 JP
- 代理机构： Bohnenberger, Johannes, Dr.
- 优先权： JP116132/90 19900502; JP116133/90 19900502; JP116134/90 19900502; JP116135/90 19900502
- 主分类号： C07C211/54
- IPC分类号： C07C211/54 ; C07C217/92 ; G03G5/06
摘要：
The present invention provides a m-phenylenediamine compound of the following general formula (I), (II) or (III). This compound is excellent in photostability. Accordingly, when this compound is contained in a photosensitive layer as an electric charge transferring material, there may be obtained an eletrophotosensitive material excellent in photostability.
wherein R¹, R², R³, R⁴, R⁵, R⁶, R⁷, R⁸, R⁹, l , m , o , p, q, r and s are as defined above.
wherein R¹, R², R³, R⁴, R⁵, R⁶, R⁷, R⁸, R⁹, l , m , o , p, q, r and s are as defined above.
公开/授权文献
信息查询
