发明公开
EP0463165A1 DEVICE AND METHOD OF MANUFACTURING THE SAME; AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
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COMPONENT，方法ITS，半导体元件和方法它的过去。
- 专利标题： DEVICE AND METHOD OF MANUFACTURING THE SAME; AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- 专利标题（中）： COMPONENT，方法ITS，半导体元件和方法它的过去。
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申请号： EP90913222.7申请日： 1990-09-07
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公开(公告)号： EP0463165A1公开(公告)日： 1992-01-02
- 发明人: OHMI, Tadahiro , MIYAWAKI, Mamoru
- 申请人： OHMI, Tadahiro , CANON KABUSHIKI KAISHA
- 申请人地址： 1-17-301, Komegabukuro 2-chome Sendai-shi Miyagi-ken 980 JP
- 专利权人： OHMI, Tadahiro,CANON KABUSHIKI KAISHA
- 当前专利权人： OHMI, Tadahiro,CANON KABUSHIKI KAISHA
- 当前专利权人地址： 1-17-301, Komegabukuro 2-chome Sendai-shi Miyagi-ken 980 JP
- 代理机构： Tiedtke, Harro, Dipl.-Ing.
- 优先权： JP233929/89 19890909
- 国际公布： WO9103841 19910321
- 主分类号： H01L29/73
- IPC分类号： H01L29/73 ; H01L29/784 ; H01L21/302 ; H01L21/285
摘要：
An element which includes a first film containing no impurity particles due to spontaneous oxidization or residual resist at its surface, and an electrically conductive material layer formed on a surface in contact with the surface of said first film. On the surface of the electrically conductive material layer is formed an insulating compound film as a result of surface reaction with the electrically conductive material layer, and on the surface of said first film is formed a desired second film that is necessary for constituting the element.
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