发明公开
EP0579244A2 A semiconductor laser and a method for producing the same
失效
Halbleiterlaser和Verfahren zur Herstellung。
- 专利标题: A semiconductor laser and a method for producing the same
- 专利标题(中): Halbleiterlaser和Verfahren zur Herstellung。
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申请号: EP93111443.3申请日: 1993-07-16
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公开(公告)号: EP0579244A2公开(公告)日: 1994-01-19
- 发明人: Kidoguchi, Isao , Kamiyama, Satoshi , Ohnaka, Kiyoshi
- 申请人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 申请人地址: 1006, Ohaza Kadoma Kadoma-shi, Osaka 571 JP
- 专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人地址: 1006, Ohaza Kadoma Kadoma-shi, Osaka 571 JP
- 代理机构: Marx, Lothar, Dr.
- 优先权: JP189074/92 19920716; JP285740/92 19921023
- 主分类号: H01S3/19
- IPC分类号: H01S3/19
摘要:
A semiconductor laser including a semiconductor substrate and a multilayer structure formed upon the semiconductor substrate, the multilayer structure including an active layer, a pair of cladding layers between which the active layer is interposed, and a current confinement layer for injecting a current into a stripe-shaped predetermined region of the active layer. The current confinement layer comprises a first current blocking layer formed in regions thereof excluding a region corresponding to the predetermined region of the active layer. The first current blocking layer has a refractive index higher than a refractive index of the pair of cladding layers and an energy band gap larger than an energy band gap of the active layer.
公开/授权文献
- EP0579244B1 A semiconductor laser and a method for producing the same 公开/授权日:1996-09-04
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