发明公开
- 专利标题: Self-organizing pattern learning system
- 专利标题(中): Selbstorganisierendes Musterlernsystem。
-
申请号: EP94103633.7申请日: 1994-03-09
-
公开(公告)号: EP0615208A2公开(公告)日: 1994-09-14
- 发明人: Ono, Shuji, c/o Fuji Photo Film Co., Ltd.
- 申请人: FUJI PHOTO FILM CO., LTD.
- 申请人地址: 210 Nakanuma Minamiashigara-shi Kanagawa-ken, 250-01 JP
- 专利权人: FUJI PHOTO FILM CO., LTD.
- 当前专利权人: FUJI PHOTO FILM CO., LTD.
- 当前专利权人地址: 210 Nakanuma Minamiashigara-shi Kanagawa-ken, 250-01 JP
- 代理机构: Klunker . Schmitt-Nilson . Hirsch
- 优先权: JP48432/93 19930310
- 主分类号: G06K9/82
- IPC分类号: G06K9/82 ; G06K9/66
摘要:
A self-organizing pattern learning system comprises an optical pattern correlation degree detecting means, which comprises a pattern storing means for storing a plurality of patterns, an input pattern displaying means for displaying a presented input pattern, and a photo detecting means. All or two of the input pattern displaying means, the pattern storing means, and the photo detecting means are located at positions adjacent to each other. The photo detecting means optically detects a degree of pattern correlation between the input pattern displayed on the input pattern displaying means and each of memory patterns stored in the pattern storing means. A learning pattern creating means creates a group of learning patterns in accordance with the degrees of pattern correlation, which have been detected by the optical pattern correlation degree detecting means, and the input pattern. A memory pattern updating means updates the memory patterns, which are stored in the pattern storing means, in accordance with the learning patterns, which have been created by the learning pattern creating means.
公开/授权文献
- EP0615208B1 Self-organizing pattern learning system 公开/授权日:2002-09-18
信息查询