发明公开
- 专利标题: X-ray analysing apparatus
- 专利标题(中): X射线分析装置。
-
申请号: EP94302171.7申请日: 1994-03-25
-
公开(公告)号: EP0617431A3公开(公告)日: 1994-12-21
- 发明人: Sudo, Shuzo , Nakajima, Kunio
- 申请人: SEIKO INSTRUMENTS INC.
- 申请人地址: 31-1, Kameido 6-chome Koto-ku Tokyo 136 JP
- 专利权人: SEIKO INSTRUMENTS INC.
- 当前专利权人: SEIKO INSTRUMENTS INC.
- 当前专利权人地址: 31-1, Kameido 6-chome Koto-ku Tokyo 136 JP
- 代理机构: Sturt, Clifford Mark
- 优先权: JP67135/93 19930325; JP91683/93 19930419; JP91688/93 19930419
- 主分类号: G21K4/00
- IPC分类号: G21K4/00 ; C09K11/84
摘要:
The present invention provides an X-ray analysing apparatus having high sensitivity and high position resolving power in which an X-ray fluorescent screen (48) including Gd₂O₂S : Tb as a material and having a surface density ranging from 5 mg/cm² to 30 mg/cm² is used, and an image intensifier (50) and a charge coupled device (CCD) (52) are combined to construct an X-ray diffraction two-dimensional detector; and also an image intensifier tube and the CCD are combined with a tapered fibre plate (49), and an alignment section of the mirror mount tube and a vacuum flexible tube are separated by an X-ray window into the atmosphere and the vacuum.
公开/授权文献
- EP0617431B1 X-ray analysing apparatus 公开/授权日:1997-05-14
信息查询