发明公开
- 专利标题： Semiconductor manufacturing apparatus
- 专利标题（中）： 半导体制造设备
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申请号： EP95109108.1申请日： 1989-03-31
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公开(公告)号： EP0673058A3公开(公告)日： 1995-10-11
- 发明人: Miyashita, Naoto , Takahashi, Koichi , Kinoshita, Hiroshi
- 申请人： KABUSHIKI KAISHA TOSHIBA
- 申请人地址： 72, Horikawa-cho, Saiwai-ku Kawasaki-shi JP
- 专利权人： KABUSHIKI KAISHA TOSHIBA
- 当前专利权人： KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址： 72, Horikawa-cho, Saiwai-ku Kawasaki-shi JP
- 代理机构： Ritter und Edler von Fischern, Bernhard, Dipl.-Ing.
- 优先权： JP76607/88 19880331
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
A semiconductor manufacturing apparatus comprising a furnace (7, 8, 14) accommodating a boat (15) which carries wafers (10) is maintained with a temperature flat area in the furnace. Mixed gas is supplied from a mixing nozzle (21) at a temperature which is lower than the temperature of the temperature flat area to flow over the wafers from positions adjacent the wafers.
公开/授权文献
- EP0673058A2 Semiconductor manufacturing apparatus 公开/授权日：1995-09-20
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