发明授权
- 专利标题： Apparatus for production of single crystal oxide films by liquid-phase epitaxy
- 专利标题（中）： 用于制造由液相外延氧化物单晶膜的装置
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申请号： EP95105134.1申请日： 1995-04-05
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公开(公告)号： EP0676492B1公开(公告)日： 1998-07-08
- 发明人: Fujino, Masaru , Takagi, Hiroshi
- 申请人： Murata Manufacturing Co., Ltd.
- 申请人地址： 2-26-10, Tenjin Nagaokakyo-shi, Kyoto-fu, 617 JP
- 专利权人： Murata Manufacturing Co., Ltd.
- 当前专利权人： Murata Manufacturing Co., Ltd.
- 当前专利权人地址： 2-26-10, Tenjin Nagaokakyo-shi, Kyoto-fu, 617 JP
- 代理机构： Schoppe, Fritz, Dipl.-Ing.
- 优先权： JP69402/94 19940407
- 主分类号： C30B19/06
- IPC分类号： C30B19/06 ; C30B19/02 ; C30B29/28
摘要：
An apparatus for production of single crystal oxide films by liquid-phase epitaxy comprises an insulating core tube with an external high frequency heating means, an electroconductive cylindrical member having openings at both ends and being arranged in the core tube, and a crucible made of an electroconductive material and coaxially arranged in the cylindrical member.
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