发明公开
EP0772800A1 LITHOGRAPHIC DEVICE WITH A THREE-DIMENSIONALLY POSITIONABLE MASK HOLDER
失效
LITHOGRAPHISCHESGERÄTMIT EINEM SOWIE HORIZONTAL ALS AUCH VERTIKAL JUSTIBBEN MASKENHALTER
- 专利标题： LITHOGRAPHIC DEVICE WITH A THREE-DIMENSIONALLY POSITIONABLE MASK HOLDER
- 专利标题（中）： LITHOGRAPHISCHESGERÄTMIT EINEM SOWIE HORIZONTAL ALS AUCH VERTIKAL JUSTIBBEN MASKENHALTER
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申请号： EP96903180.0申请日： 1996-03-11
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公开(公告)号： EP0772800A1公开(公告)日： 1997-05-14
- 发明人: LOOPSTRA, Erik, Roelof , SPERLING, Frank, Bernhard , MEIJER, Hendricus, Johannes, Maria , VAN EIJK, Jan
- 申请人： PHILIPS ELECTRONICS N.V. , ASM Lithography
- 申请人地址： Groenewoudseweg 1 5621 BA Eindhoven NL
- 专利权人： PHILIPS ELECTRONICS N.V.,ASM Lithography
- 当前专利权人： PHILIPS ELECTRONICS N.V.,ASM Lithography
- 当前专利权人地址： Groenewoudseweg 1 5621 BA Eindhoven NL
- 代理机构： Wolfs, Marc Johannes Maria
- 优先权： EP19950201400 19950530
- 国际公布： WO1996038764 19961205
- 主分类号： G03F7
- IPC分类号： G03F7 ; G03F9 ; H01L21
摘要：
The lithographic appts. includes a machine frame (45) which, seen parallel to a vertical Z direction, supports a substrate holder positioned by a device parallel to the X direction perpendicular to the Z, and a Y direction perpendicular to the X and the Z. Also included is a focusing system with a main axis directed parallel to the Z direction, and a mask holder is positioned parallel to the X by a second positioner and a radiation source. The mask holder (5) is also positionable parallel to the Y direction and is rotatable about an axis of rotation parallel to the Z direction using the second positioning device.
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