发明公开
- 专利标题: FINE POSITIONING APPARATUS WITH ATOMIC RESOLUTION
- 专利标题(中): 用原子释放精调装置
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申请号: EP94927506.0申请日: 1994-08-27
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公开(公告)号: EP0783662A1公开(公告)日: 1997-07-16
- 发明人: BINNIG, Gerd, K. , HAEBERLE, Walter , ROHRER, Heinrich , SMITH, Douglas, P., E.
- 申请人: International Business Machines Corporation
- 申请人地址: Old Orchard Road Armonk, N.Y. 10504 US
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: Old Orchard Road Armonk, N.Y. 10504 US
- 代理机构: Klett, Peter Michael
- 国际公布: WO1996007074 19960307
- 主分类号: G01B7
- IPC分类号: G01B7 ; G01B21 ; G01Q10 ; G05D3 ; G11B21 ; H02K33 ; H02K41 ; G11B5 ; G11B9
摘要:
A fine positioning apparatus is provided which comprises inductive actuators (2, 3). A positioning accuracy of well below 1 nm is achieved compared to 1 νm provided by known inductive actuators. In preferred embodiments, the motion of the magnetic actuator is dampened or decreased by mechanical means (5, 6, 35), thus increasing the amount of current necessary to move the actuator. The fine positioner can be used in the field of scanning probe microscopy.
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