The present invention relates to a stress stable lathering skin cleansing liquid composition comprising by weight parts of the liquid composition: (a) from about 0.5 parts to 6 parts dispersed smectite clay, i.e. bentonite, hectorite or combinations thereof, (b) from about 5 parts to about 30 parts of lipid skin moisturizing agent having a Vaughan Solubility Parameter (VSP) of between 5 and 10; wherein said lipid has a shear index, n, value at 35°C in the range 0.1 to 0.5 and a consistency, k, value at 35°C in the range 10 to 3,000 poise; (c) from about 5 parts to about 30 parts of surfactant; and, (d) water; wherein said surfactant has a combined CMC equilibrium surface tension value of from 15 to 50; and wherein said stress stable lathering skin cleansing liquid composition has a Lipid Deposition Value (LDV) of from about 5 to about 1,000; and wherein said composition is stable for at least two weeks AT 100°F (38°C).