发明公开
EP0820132A3 Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube 失效
准分子激光器振荡设备和方法,受激准分子激光曝光设备和激光管

Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube
摘要:
This invention relates to an excimer laser oscillation apparatus which has a laser chamber (20) which stores a laser gas containing a gas mixture of at least one inert gas selected from the group consisting of Kr, Ar, and Ne, and F 2 gas, and in which an inner surface thereof has a reflection-free surface (3) with respect to light of a desired wavelength of 248 nm, 193 nm, or 157 nm, and the uppermost surface of the inner surface consists of a fluoride, an optical resonator which is made up of a pair of reflection mirrors (5,6) arranged to sandwich the laser chamber (20) therebetween, and in which the reflectance of the reflection mirror (6) on the output side is 90% or more and microwave introduction means (300,303,302), arranged on the laser chamber (20), for continuously exciting the laser gas in the laser chamber (20).
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