发明公开
- 专利标题： DISPOSITIF POUR DEPOSER UN MATERIAU PAR EVAPORATION SUR DES SUBSTRATS DE GRANDE SURFACE
- 专利标题（英）： Device for vapour-depositing a material on high surface area substrates
- 专利标题（中）： 设备技术材料涂层大面积衬底
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申请号： EP96915075.0申请日： 1996-04-23
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公开(公告)号： EP0824603A1公开(公告)日： 1998-02-25
- 发明人: IDA, Michel , PERRIN, Aimé , BOREL, Michel , CHARLES, Raymond
- 申请人： COMMISSARIAT A L'ENERGIE ATOMIQUE
- 申请人地址： 31-33, rue de la Fédération 75015 Paris FR
- 专利权人： COMMISSARIAT A L'ENERGIE ATOMIQUE
- 当前专利权人： COMMISSARIAT A L'ENERGIE ATOMIQUE
- 当前专利权人地址： 31-33, rue de la Fédération 75015 Paris FR
- 代理机构： Dubois-Chabert, Guy, et al
- 优先权： FR19950004873 19950424
- 国际公布： WO1996034123 19961031
- 主分类号： C23C14
- IPC分类号： C23C14 ; H01J9
摘要：
A device for vapour-depositing a material on a substrate (112), characterised in that it comprises a housing in which n sources (44, 46) for vaporising the material are provided, and means for directing, during vaporisation, the vapour emitted by said sources to the substrate, said means being formed by walls (59) or screens defining compartments within the housing, each vaporisation source (44, 46) being arranged in one compartment. The device may also contain means for moving the substrate for a more regular deposition.
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