发明公开
- 专利标题: LIQUID APPLICATION NOZZLE, METHOD OF MANUFACTURING SAME, LIQUID APPLICATION METHOD, LIQUID APPLICATION DEVICE, AND METHOD OF MANUFACTURING CATHODE-RAY TUBE
- 专利标题(中): 喷嘴施加液体,你的过程,液体涂覆方法和装置方法的阴极射线管
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申请号: EP97904583申请日: 1997-02-20
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公开(公告)号: EP0827783A4公开(公告)日: 2000-12-06
- 发明人: MITANI MASATO , NAKAJIMA KAZUTO , KOTANI HIROYUKI , HOKAZONO NOBUTAKA , NAKA HIROYUKI , YAMAGUCHI AKIRA , IKEDA JUNJI , AOKI NOBUYUKI
- 申请人: MATSUSHITA ELECTRIC IND CO LTD , MATSUSHITA ELECTRONICS CORP
- 专利权人: MATSUSHITA ELECTRIC IND CO LTD,MATSUSHITA ELECTRONICS CORP
- 当前专利权人: MATSUSHITA ELECTRIC IND CO LTD,MATSUSHITA ELECTRONICS CORP
- 优先权: JP3339196 1996-02-21; JP27110496 1996-10-14
- 主分类号: B05B7/02
- IPC分类号: B05B7/02 ; B05B7/08 ; B05C5/02 ; B05C11/08 ; H01J9/227 ; B05C5/00
摘要:
Each of liquid application nozzles (4, 4a, 124) comprises a first block (41) having therein a liquid reservoir (43) extending in a longitudinal direction and an inner discharge portion composed of a multiplicity of small holes (44) formed in a bottom of the liquid reservoir (43) to extend along the longitudinal direction, a second block (42) having an inner space, which forms a gas reservoir (46) extending outside the first block (41) in the longitudinal direction, and an outer discharge portion composed of a multiplicity of small holes (48) and formed at the bottom of the inner space along the longitudinal direction and adapted to form a gas stream to surround from outside a linear-shaped liquid flow flowing down from the small holes (44), whereby a thin coating can be formed in a short time while suppressing consumption of a liquid and unevenness in coating is made hard to generate.
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