发明公开
EP0832942A3 Dyes for color filters, photosensitive resist resin compositions containing the same, and color filters
失效
用于滤色器的染料，含有光敏这些染料抗蚀剂组合物，和对应的滤色器
- 专利标题： Dyes for color filters, photosensitive resist resin compositions containing the same, and color filters
- 专利标题（中）： 用于滤色器的染料，含有光敏这些染料抗蚀剂组合物，和对应的滤色器
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申请号： EP97118306.6申请日： 1992-12-11
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公开(公告)号： EP0832942A3公开(公告)日： 2000-05-31
- 发明人: Itoh, Hisato , Karasawa, Akio , Sugimoto, Kenichi
- 申请人： Mitsui Chemicals, Inc.
- 申请人地址： 2-5, Kasumigaseki 3-chome, Chiyoda-ku Tokyo 100-6070 JP
- 专利权人： Mitsui Chemicals, Inc.
- 当前专利权人： Mitsui Chemicals, Inc.
- 当前专利权人地址： 2-5, Kasumigaseki 3-chome, Chiyoda-ku Tokyo 100-6070 JP
- 代理机构： Stuart, Ian Alexander
- 优先权： JP32847491 19911212
- 主分类号： C09B69/10
- IPC分类号： C09B69/10 ; G03C7/12 ; G03F7/027 ; G03F7/00
摘要：
Dyes suitable for use in the fabrication of color filters are of molecular weight 500-4000. They contain one or more photopolymerizable substituents and are represented by one of the following formulae:D-(B-Z) m and D-E-D wherein D represents a chromophoric nucleus, Band E denote connecting groups, Z is -COOR 9 , -CONR 10 R 11 , -OCOR 12 , -OCOOR 13 , -OCONHR 14 , -NHR 15 or -NR 16 R 17 and mis an integer of 1-10. Also described are photosensitive resist resin compositions containing the dyes as well as color filters fabricated by curing the photosensitive resist resin compositions.
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