发明公开
EP0887833A3 Process for preparing phosphor pattern for field emission panel, photosensitive element for field emission display panel, phosphor pattern for field emission display panel and field emission display panel
失效
一种制备荧光图案用于场致发射显示面板中,用于场致发射显示面板的光敏元件与荧光体图案,和场致发射显示面板的过程
- 专利标题: Process for preparing phosphor pattern for field emission panel, photosensitive element for field emission display panel, phosphor pattern for field emission display panel and field emission display panel
- 专利标题(中): 一种制备荧光图案用于场致发射显示面板中,用于场致发射显示面板的光敏元件与荧光体图案,和场致发射显示面板的过程
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申请号: EP98401222.9申请日: 1998-05-20
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公开(公告)号: EP0887833A3公开(公告)日: 2000-02-02
- 发明人: Tai, Seiji , Horibe, Yoshiyuki , Tanaka, Hiroyuki , Nojiri, Takeshi , Satou, Kazuya , Kimura, Naoki , Shimamura, Mariko
- 申请人: Hitachi Chemical Co., Ltd.
- 申请人地址: 1-1, Nishishinjuku 2-chome Shinjuku-ku, Tokyo 160 JP
- 专利权人: Hitachi Chemical Co., Ltd.
- 当前专利权人: Hitachi Chemical Co., Ltd.
- 当前专利权人地址: 1-1, Nishishinjuku 2-chome Shinjuku-ku, Tokyo 160 JP
- 代理机构: Koch, Gustave
- 优先权: JP13225497 19970522
- 主分类号: H01J9/227
- IPC分类号: H01J9/227
摘要:
Disclosed are a process for preparing a phosphor pattern for a field emission display panel which comprises the steps of: (I) forming (A) a photosensitive resin composition layer containing a phosphor on a substrate to which a conductive layer is formed; (II) irradiating active light to (A) the photosensitive resin composition layer containing a phosphor imagewisely; (III) selectively removing (A) the photosensitive resin composition layer to which active light has been imagewisely irradiated by development to form a pattern; and (IV) calcining the pattern to remove unnecessary portion to form a phosphor pattern, a photosensitive element for a FED display panel, phosphor pattern for a FED display panel, and a FED display panel.
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