A positioning device (3) suitable for use in a lithographic device with an exposure position and a characterization position has a displacement system (35) comprising a first displacement unit (39) and a second displacement unit (41) to which object holders (21, 23) can be coupled alternately. The first displacement unit is suitable for carrying out a first series of positioning steps of a first object holder (21) in a first position and for displacing the first object holder from the first position into an intermediate position (M', M'') between the first position and a second position. The second displacement unit is suitable for carrying out a second series of positioning steps of a second object holder (23) in the second position simultaneously with an independently from the first displacement unit and for displacing the second object holder from the second position into the intermediate position. In the intermediate position, the object holders are exchanged, after which the first series of positioning steps can be carried out by the first displacement unit with the second object holder in the first position and the second series of positioning steps can be carried out by the second displacement unit with the first object holder in the second position.